SUBSTRATE ALIGNMENT APPARATUS WITH HORN-LIKE GAS DISCHARGE PART, SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TRANSFER APPARATUS

摘要

PURPOSE: A substrate alignment apparatus, a substrate treatment apparatus and a substrate transfer apparatus are provided to align safely and exactly a substrate to be treated without damage of the substrate by floating substantially the substrate from a support pin using a horn-like gas discharge part. CONSTITUTION: A substrate alignment apparatus includes a plurality of supporters, a horn-like gas discharge part, a position determining part and a support pin. The plurality of supporters(114) are discretely arranged to support a substrate to be treated(G) in a nearly horizontal state. The horn-like gas discharge part(110) is installed on each supporter to float substantially the substrate. The position determining part is used for aligning exactly the substrate. The support pin(108) is surrounded by the gas discharge part on the supporter to load finally the substrate.