| 发明名称 |
ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST |
| 摘要 |
THE PRESENT INVENTION RELATES TO A NOVEL ANTIREFLECTING COATING COMPOSITION, WHERE THE COMPOSITION COMPRISES A POLYMER, THERMAL ACID GENERATOR AND A SOLVENT COMPOSITION. THE INVENTION FURTHER COMPRISESPROCESSES FOR THE USE OF SUCH A COMPOSITION IN PHOTOLITHOGRAPHY. THE COMPOSITION STRONGLY ABSORBS RADIATION RANGING FROM ABOUT 130 NM (NANOMETER) TO ABOUT 250 NM.
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| 申请公布号 |
MY117076(A) |
申请公布日期 |
2004.04.30 |
| 申请号 |
MYPI9904952 |
申请日期 |
1999.11.15 |
| 申请人 |
AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
MUNIRATHNA PADMANABAN;RALPH R. DAMMEL;STANLEY A, FICNER;JOSEPH E. OBERLANDER;JOHN P. SAGAN |
| 分类号 |
G03F7/004;G03F7/11;G03F7/09;H01L21/027 |
主分类号 |
G03F7/004 |
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