| 摘要 |
PURPOSE: An electron beam apparatus is provided to achieve improved luminance and quality of image by suppressing a deviation of electron beam caused due to a spacer. CONSTITUTION: An electron beam apparatus comprises an electron source including an electron emitting element; an electron beam radiating member opposed to the electron source and radiated by the electron emitted from the electron emitting element; an electric potential defining plate interposed between the electron source and the electron beam radiating member, wherein the electric potential defining plate includes a plurality of openings for passage of the electron emitted from the electron emitting element; and a spacer(16) interposed between the electron beam radiating member and the electric potential defining plate. An expression D1<D2 is satisfied, wherein D1 is the distance between the region between the spacer and one of the openings which is formed in the vicinity of the spacer and the electron beam radiating member, and D2 is the distance between the region between the opening and another opening which is not formed in the vicinity of the spacer and the electron beam radiating member.
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