COOLING SYSTEM OF WAFER PHOTO ETCHING APPARATUS

摘要

PURPOSE: A cooling system of a wafer photo etching apparatus is provided to perform a temperature control operation regardless of a defect of a temperature controller of one unit and enhance the productivity by installing the temperature controller at each unit of the wafer photo etching apparatus. CONSTITUTION: A cooling system of a wafer photo etching apparatus includes a plurality of temperature controller for controlling totally the temperature of each unit of the wafer photo etching apparatus. The temperature controllers are installed at each unit of the wafer photo etching apparatus in order to control independently the temperature of each unit of the wafer photo etching apparatus. Two temperature controllers are installed at each unit of the wafer photo etching apparatus.