| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaporation source for an organic material and its vapor deposition device in which temperature rising time is shortened and depositing rate is stabilized in a short time, and a lot of material can be filled, and in which there is no clogging of material at the nozzle and the depositing rate can be controlled in superior precision, in the deposition device in which organic material is formed in a film on the substrate by heating, sublimating, or melt-evaporating the material at the vapor deposition of the organic material on the substrate. SOLUTION: As the evaporation source for the organic material, a crucible made of metal is used and directly heated by high frequency induction heating, and the exothermic source around the crucible is removed and thermal response is remarkably improved. Thereby, even if the crucible is of a large size, the temperature rising time is reduced, and the depositing rate is stabilized in short time and in the superior precision. COPYRIGHT: (C)2004,JPO
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