发明名称 EXPOSURE MASK AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To prevent division lines due to overlap misalignment and variations in exposure luminance at seams of division from being visually recognized during display of a liquid crystal display device by diminishing the differences in exposure energy in the seams of boundary portions between exposure shots to be stepwise carried out. <P>SOLUTION: Exposure regions 103 and light shielding regions 104 are arranged within one reticle in such a manner that the exposure regions and light shielding regions repeat alternately longitudinally and transversely. A substrate is subjected to stepping exposure by using such reticle. In such a case, the regions to be exposed by the respective shots A to M in the boundary portions of the reticle to be exposed undergo the stepping exposure so as not to be contiguous with one another and therefore the illuminance differences between the respective shots are mitigated and the differences in the result by the luminance differences of the shot boundaries are mitigated, so that the differences is not visible to the human eyes. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004133200(A) 申请公布日期 2004.04.30
申请号 JP20020297610 申请日期 2002.10.10
申请人 NEC KAGOSHIMA LTD 发明人 NAKADA SHINICHI;ISHINO TAKAYUKI;YAMASHITA MASAMI
分类号 G02F1/13;G03F1/70;G03F7/00;G03F7/20;G03F9/00;H01L21/027 主分类号 G02F1/13
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