ELECTRON BEAM EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To restrain generation of measuring error of a laser interferometer for measuring position of a stage which error is caused by change of atmospheric pressure, in an electron beam exposure system. SOLUTION: A trestle 10 is installed on enclosure of a testpiece room 4. A holder 15 for fixing the laser interferometer 16 is retained with the trestle 10 and arranged penetrating a testpiece room top plate 5. The holder 15 is made to become independent of the top plate 5 structurally. A sealing member 18a for sealing a penetrating part of the holder 15 and the top plate 5 is installed. COPYRIGHT: (C)2004,JPO