| 摘要 |
<p>Methods of making a polycrystalline silicon thin-film transistor having a uniform microstructure. One exemplary method requires receiving a polycrystalline silicon thin film having a grain structure which is periodic in at least a first direction, and placing at least portions ( 410, 420 ) of one or more thin-film transistors on the received film such that they are tilted relative to the periodic structure of the thin film.</p> |
