METHOD OF FORMING FINE-PATTERN USING HYDROPHILIC SOLVENT

摘要

PURPOSE: A method of forming a fine-pattern is provided to improve the step coverage and uniformity of a coating material and to reduce a usable amount of the coating material by using a hydrophilic solvent. CONSTITUTION: Hydrophilic processing is performed on a substrate with a photoresist pattern by using a hydrophilic solvent. A coating material is coated on the substrate. The coating material is thermally shrunk from a heat treatment. At this time, the thermally shrunk coating material obtains an improved CD(Critical Dimension) for the photoresist pattern. The coating material is substantially removed therefrom.