| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a halftone phase shift mask blank which excels in workability, and has an excellent chemical resistance, and resistance to alkaline chemicals in particular, and a method for manufacturing the same. <P>SOLUTION: The halftone phase shift mask blank has a phase shifter film consisting of a metal silicide compound containing one or more metals selected from molybdenum, tantalum, zirconium, chromium, and tungsten, and one or more elements selected from oxygen, nitrogen and carbon on a transparent substrate. <P>COPYRIGHT: (C)2004,JPO |
