发明名称 TWO POWER SUPPLY SYSTEM PLASMA GENERATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide such a method that can reduce power loss by utilizing a simpler and low-cost power supply under a pressure near an atmospheric pressure or a reduced pressure, simply generate stable glow discharging without using an expensive gas such as helium or the like, and produce RIE effect in various fields. <P>SOLUTION: A glow discharging plasma processing method uses not a single power supply as a power supply for generating plasma even under a pressure near an atmospheric pressure, but two kinds of power supply with different frequencies wherein a dielectric is arranged on the surface of a counter electrode on at least one side of a high-frequency application electrode (No dielectric may be required depending on the purpose). In the respective electrodes, high-frequency voltages with different frequencies are applied to superimpose the respective voltages, so as to more increase or decrease a difference of potential among the electrodes for a certain time period than the voltage of the respective individual power supply, and the rising and falling of voltage is quickened to select appropriate frequency and voltage that may ease the generation of glow discharging. As a result, more stable glow discharging can be produced. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004134716(A) 申请公布日期 2004.04.30
申请号 JP20020332889 申请日期 2002.10.11
申请人 MORI ENGINEERING:KK 发明人 SAITO MIYUKI;HATANAKA TOSHIHIKO;MIURA SHUNJI;SAKURAI RIKUO
分类号 H05H1/24;B01J19/08;H01L21/3065 主分类号 H05H1/24
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