| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an antistatic film having excellent antistaticity and effective for preventing static failure caused by the discharge of accumulated static charge and failure caused by the sticking of films and the adhesion of photosensitive material scraps and dust. SOLUTION: The antistatic film is produced by simulating the proper range of the static characteristic of the film to be produced to define the range on an R-V diagram drawn by using the accumulated charge quantity (V) as one coordinate of a two-dimensional coordinate system and the surface resistivity (R) as the other coordinate and producing the film in a manner to satisfy the proper range of the charge characteristics on the diagram. Preferably, films having varied static charge and/or surface resistivity are produced and simulated under a prescribed condition, and the R-V diagram of the film to be produced is drawn by using the accumulated charge quantity (V) as one coordinate of a two-dimensional coordinate system and the surface resistivity (R) as the other coordinate. COPYRIGHT: (C)2004,JPO |
