| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a titanium oxide layer which is good in adhesivity and adhesiveness after irradiation with UV rays even after resting for a long time under and at high humidity and high temperature although a titanium oxide layer is manufactured in a short period of time by a plasma enhanced CVD (Chemical Vapor Deposition) method, and to provide the titanium oxide layer manufactured by using the method, and an antireflection film using the titanium oxide layer in a laminate. <P>SOLUTION: According to the method for manufacturing the titanium oxide layer, the plasma enhanced CVD method comprises supplying a gaseous organic titanium compound and gaseous hydrogen into a reaction chamber 14, allowing the gases to discharge electricity to form a plasma 21 state and laminating the titanium oxide layer 22 on a substrate surface 11 placed in the reaction chamber 14, in which the titanium oxide layer 22 is laminated by supplying gaseous oxygen and reactive inert gas in addition to the gaseous organic titanium compound and the gaseous hydrogen and therefore the reaction with the hydrogen is made possible even in the portions turning to residues in the conventional plasma enhanced CVD method. <P>COPYRIGHT: (C)2004,JPO |
