EXPOSURE MASK

摘要

PURPOSE: An exposure mask is provided to compensate for a reduced size of a storage node contact part caused by a bird's beak by making a storage node contact part in an active region of a diagonal type in an exposure mask such that the storage node contact part in the exposure mask is greater than a storage node contact part in a device active region of a diagonal type formed on a semiconductor substrate. CONSTITUTION: The width(a) of the storage node contact part(15) is 1.05-1.4 times as large as the width(b) of a bitline contact part(17) and is 1.15-2.5 times as large as the width(c) between the storage node contact part and its adjacent storage node contact part(15) in the active region(11). The width(d) between the storage node contact part and its adjacent bitline contact part in the active region is 0.85-1.0 times as small as the width(c). The length(e) of the storage node contact part is 1.05-1.2 times as large as the sum of the width(a) and the width(c).