FLOW RATE CONTROLLING APPARATUS WITH AIR TUBE IN SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: An apparatus of semiconductor equipment is provided to control exactly flow rate by using an air tube. CONSTITUTION: A flowing path(15) of a chamber(13) is defined by a support part(14). The support part is formed on an inner wall of the chamber. An air tube(16) is in the flowing path. The air tube is capable of being shrunk and expanded by providing or exhausting air to or from the same according to a signal of a pressure controller(11). The air tube and the support part are made of different materials.