发明名称 APPARATUS FOR MANUFACTURING SYNTHETIC QUARTZ GLASS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing synthetic quartz glass by which the synthetic quartz glass having improved uniformity in the radial direction is manufactured while preventing the collapse of the periphery of ingot. SOLUTION: The apparatus for the synthetic quartz glass is provided with a burner 12 for jetting a gaseous starting material and a combustion gas from a jetting port 12a to a synthesizing furnace 11 to form flame and a target 14 arranged to face the jetting port 12a of the burner 12. In the apparatus, the ingot 15 is formed by depositing soot formed by the flame of the burner 12 on the target 14 and the burner 12 and the target 14 are arranged so that a zone where the flame reaches the synthesizing temperature coincides with the synthesizing surface 20 of the ingot 15. The whole opening surface area of the jetting port 12a of the burner 12 is controlled to be≥1/10 of the surface area of the deposition surface of the target 14, and the jetting port 12a of the burner 12 is arranged at a distance Z apart from the synthesizing surface 20 of the ingot 15 by≤1/2 of the diameter D of the ingot 15, and the gaseous starting material is jetted from a plurality of places by the burner 12. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004131337(A) 申请公布日期 2004.04.30
申请号 JP20020298140 申请日期 2002.10.11
申请人 NIKON CORP 发明人 IWASAKI TAKESHI;YAMAGUCHI TOMOHISA;JINBO HIROKI
分类号 C03B8/04;(IPC1-7):C03B8/04 主分类号 C03B8/04
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