METHOD FOR PRODUCING A GALLIUM NITRIDE EPITAXIAL LAYER,申请号SG20020002210-传众专利搜索

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发明名称	METHOD FOR PRODUCING A GALLIUM NITRIDE EPITAXIAL LAYER
摘要
申请公布号	SG103342(A1)	申请公布日期	2004.04.29
申请号	SG20020002210	申请日期	1998.10.15
申请人	LUMILOG	发明人	BEAUMONT, BERNARD;GIBART, PIERRE;GUILLAUME, JEAN-CLAUDE;NATAF, GILLES;VAILLE, MICHEL;HAFFOUZ, SOUFIEN
分类号	C30B29/38;C30B25/02;H01L21/20;H01L33/00;H01S5/323;(IPC1-7):C30B25/02;C30B29/40	主分类号	C30B29/38
代理机构		代理人
主权项
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