发明名称 Exhaust apparatus for process apparatus and method of removing impurity gas
摘要 An exhaust apparatus for a process apparatus which processes an object using a process gas includes an exhaust pipe to be connected to an exhaust port of the process apparatus, and a trap mechanism connected to the exhaust pipe, for removing an impurity gas contained in an exhaust gas from the process apparatus. A reaction-gas supply mechanism is provided in the exhaust pipe at an upstream of the trap mechanism, for feeding a reaction gas which is reacted with the impurity gas in to exhaust pipe to lower a vapor pressure of the impurity gas.
申请公布号 US2004081607(A1) 申请公布日期 2004.04.29
申请号 US20030724745 申请日期 2003.12.02
申请人 TOKYO ELECTRON LIMITED 发明人 HASEGAWA TOSHIO
分类号 B01D53/34;B01D53/68;C23C16/44;(IPC1-7):B01D53/68 主分类号 B01D53/34
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