发明名称 Device inspecting for defect on semiconductor wafer surface
摘要 An inspection device inspecting for a defect based on an image of wafer surface includes an imaging device obtaining an image data of a wafer subjected to inspection, a storage circuit storing an image data of a wafer for comparison reference, an image comparison unit comparing the image data of the wafer subjected to inspection and the image data of the wafer for comparison reference using a pre-set inspection condition, an acquiring circuit acquiring the WIP data of the wafer subjected to inspection, and a WIP data operating unit setting the inspection condition based on the obtained WIP data.
申请公布号 US2004080742(A1) 申请公布日期 2004.04.29
申请号 US20030386558 申请日期 2003.03.13
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MIZUO MARIKO;KATAYAMA TOSHIHARU
分类号 G01B11/02;G01B11/30;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01N21/00 主分类号 G01B11/02
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