发明名称 |
Device inspecting for defect on semiconductor wafer surface |
摘要 |
An inspection device inspecting for a defect based on an image of wafer surface includes an imaging device obtaining an image data of a wafer subjected to inspection, a storage circuit storing an image data of a wafer for comparison reference, an image comparison unit comparing the image data of the wafer subjected to inspection and the image data of the wafer for comparison reference using a pre-set inspection condition, an acquiring circuit acquiring the WIP data of the wafer subjected to inspection, and a WIP data operating unit setting the inspection condition based on the obtained WIP data.
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申请公布号 |
US2004080742(A1) |
申请公布日期 |
2004.04.29 |
申请号 |
US20030386558 |
申请日期 |
2003.03.13 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MIZUO MARIKO;KATAYAMA TOSHIHARU |
分类号 |
G01B11/02;G01B11/30;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01N21/00 |
主分类号 |
G01B11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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