| 发明名称 |
A LITOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.</p> |
| 申请公布号 |
SG103379(A1) |
申请公布日期 |
2004.04.29 |
| 申请号 |
SG20020007470 |
申请日期 |
2002.12.09 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JACOBS, HERNES;VEN DER SCHOOT, HARMEN, KLAAS;VOSTERS, PETRUS, MATTHIJS, HENRICUS;DE GROOT, TON |
| 分类号 |
G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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