A DENSE PLASMA FOCUS RADIATION SOURCE

摘要

The invention pertains to a dense plasma focus radiation source for generati ng EUV radiation using Lithium vapor and including a coaxially disposed anode (46) and cathode (44). The invention further includes methods and apparatuse s for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode (46) and cathode (44), for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber (36), and for feeding Lithium into the discharge chamber (36).