发明名称 Method of forming a sputtering target assembly and assembly made therefrom
摘要 A method of forming a sputtering target assembly and the sputtering target assembly made therefrom are described. The method includes bonding a sputtering target to a backing plate at a low temperature. Also described is a method of forming a sputtering target assembly such that a gap is formed between the sputtering target and the backing plate. Also described is a method of forming a sputtering target assembly providing a mechanism to prevent unintended sputtering into the backing plate.
申请公布号 US2004079634(A1) 申请公布日期 2004.04.29
申请号 US20030689771 申请日期 2003.10.21
申请人 WICKERSHAM CHARLES E.;WORKMAN DAVID P. 发明人 WICKERSHAM CHARLES E.;WORKMAN DAVID P.
分类号 B21K25/00;B23K1/00;C23C14/34;(IPC1-7):C23C14/35;B23K9/235 主分类号 B21K25/00
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