发明名称 |
HEXAARYLBIIMIDAZOLE COMPOUNDS AND PHOTOPOLYMERIZATION INITIATOR COMPOSITIONS CONTAINING THE SAME |
摘要 |
The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R>1< represents a halogen, and each R>2< represents an optionally substituted C>1-4< alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like. |
申请公布号 |
WO2004035546(A1) |
申请公布日期 |
2004.04.29 |
申请号 |
WO2003JP12618 |
申请日期 |
2003.10.01 |
申请人 |
SHOWA DENKO K. K.;KAMATA, HIROTOSHI;MIZO, TATSUHIRO;ONISHI, MINA |
发明人 |
KAMATA, HIROTOSHI;MIZO, TATSUHIRO;ONISHI, MINA |
分类号 |
C07D233/54;C07D233/88;C08F2/50;G03F7/00;G03F7/027;G03F7/031 |
主分类号 |
C07D233/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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