发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device has a plurality of capacitors. The semiconductor device includes a first capacitor arranged on a substrate and including first upper and lower electrode layers between which a first capacitor insulation film is interposed, and a second capacitor arranged on the substrate and including second upper and lower electrode layers between which a second capacitor insulation film is interposed, the second upper and lower electrode layers having a same structure as that of the first upper and lower electrode layers, and the second capacitor having a per-unit-area capacity different from that of the first capacitor.
申请公布号 US2004079980(A1) 申请公布日期 2004.04.29
申请号 US20030368642 申请日期 2003.02.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIEDA KATSUHIKO
分类号 H01L27/04;H01L21/00;H01L21/02;H01L21/318;H01L21/82;H01L21/822;H01L21/8242;H01L27/08;H01L27/108;H01L29/00;(IPC1-7):H01L27/108 主分类号 H01L27/04
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