发明名称 A METHOD AND APPARATUS FOR FABRICATING ENCAPSULATED MICRO-CHANNELS IN A SUBSTRATE
摘要 A method and apparatus for fabricating encapsulated micro-channels in a substrate is described. The method includes the formation of a thin film layer over an area of a substrate. Following the formation of the thin layer, a periodic array of access windows are formed within the thin film layer along dimensions of one or more desired micro-channels. Following formation of the access windows, the one or more micro-channels are formed within an underlying layer of the substrate. Finally, the one or more micro-channels are encapsulated, thereby closing the one or more access windows along the dimensions of the desired micro-channels. Accordingly, the method is suitable in one context for rapid prototyping of micro-electromechanical systems in the areas of, for example, RF micro-systems, fluidic micro-systems and bio-fluidic applications. In addition, the method enables the rapid prototyping of integrated circuits.
申请公布号 WO03101886(A3) 申请公布日期 2004.04.29
申请号 WO2002US20018 申请日期 2002.06.21
申请人 INTEL CORPORATION (A DELAWARE CORPORATION);WINER, PAUL;ROWLETTE, JEREMY 发明人 WINER, PAUL;ROWLETTE, JEREMY
分类号 B81B1/00;B81C1/00 主分类号 B81B1/00
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