发明名称 Processing-Subject cleaning method and apparatus, and device manufacturing method and device
摘要 [Object] To reduce the amounts of cleaning liquids and rinse liquid used, as well as the energy consumption. [Means for solution] A cleaning head 12 has a plurality of cleaning units 50 and a drying unit 60. An organic substance cleaning portion 52 of each cleaning unit 50 blows a first cleaning agent 68 selectively over a portion to be cleaned of a substrate 100, and sucks reaction products etc. through a first suction mouth 72. An inorganic substance cleaning portion 54 blows a second cleaning agent 74 over the portion to be cleaned of the substrate from which organic substance have been removed, and sucks reaction products etc. through a second suction mouth. A rinse portion 56 blows pure water 82 the portion of the substrate 100 from which inorganic substance have been removed, and sucks its vapor through a third suction mouth 88. The drying unit 60 dries the substrate 100 by blowing out a heated gas 90 from a hot wind blowing-out mouth 61. A light guide 62 illuminates the portion to be cleaned of the substrate with ultraviolet light 92, and thereby decomposes residual organic substances.
申请公布号 US2004079387(A1) 申请公布日期 2004.04.29
申请号 US20030366664 申请日期 2003.02.14
申请人 SEIKO EPSON CORPORATION 发明人 MORI YOSHIAKI
分类号 B08B5/00;B08B3/02;B08B3/08;C03C23/00;H01L21/00;H01L21/304;(IPC1-7):C23G1/00 主分类号 B08B5/00
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