发明名称 |
Dry etching apparatus, dry etching method, and plate and tray used therein |
摘要 |
A dry etching apparatus that performs etching on a substrate 1 placed on a tray 13 inside a chamber 18 by covering the substrate 1 with a plate 14 provided with opening portions 15, in which a distance D between the surface opposing the substrate 1 and the substrate 1 in the peripheral portion of the plate 14 is set shorter than the distance D between the surface opposing the substrate 1 and the substrate 1 in the central portion of the plate 14. Textures can be thus formed homogeneously on the surface of the substrate.
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申请公布号 |
US2004079725(A1) |
申请公布日期 |
2004.04.29 |
申请号 |
US20030650504 |
申请日期 |
2003.08.27 |
申请人 |
KYOCERA CORPORATION |
发明人 |
INOMATA YOSUKE;FUKAWA YUKO |
分类号 |
H01J37/32;H01L21/00;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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