发明名称 |
Integrated surface metrology |
摘要 |
This invention is an instrument adaptable for integration into a process tool the combines a number of instruments for surface characterization. As an integrated process monitor, the invention is capable of monitoring surface dishing, surface erosion and thickness of residue layers on work-pieces with little time delay. The invention is adaptable to making measurements while a wafer or work-piece is either wet or dry. A preferred embodiment includes an integrated optical profiler adapted to surface profiling in the presence of optical interference arising from retro-reflections from underlying optical non-uniformities Alternate embodiments include an integrated stylus profiler with vibration isolation.
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申请公布号 |
US2004080757(A1) |
申请公布日期 |
2004.04.29 |
申请号 |
US20030654073 |
申请日期 |
2003.09.03 |
申请人 |
STANKE FRED E.;HASAN TALAT F.;WEBER MICHAEL |
发明人 |
STANKE FRED E.;HASAN TALAT F.;WEBER MICHAEL |
分类号 |
B24B37/04;B24B49/12;G01B11/06;G01B11/30;G01N21/21;G01N21/95;H01L21/66;H01L21/67;(IPC1-7):G01B11/24 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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