发明名称 |
EXPOSURE SYSTEM AND PRODUCTION METHOD FOR EXPOSURE SYSTEM |
摘要 |
<p>An exposure system storing a current value properly determined for supply to a light emitting element, and a production method for producing such an exposure system. The production method is characterized by comprising the steps of supplying a reference current to a light emitting element to respectively measure light quantities from a plurality of pixels of an optical modulation element, judging whether a minimum value of light quantities from the plurality of pixels falls within a predetermined range, and, if the minimum value does not fall within the range, determining a current value to be supplied to a light emitting element that allows the minimum value to fall within the range.</p> |
申请公布号 |
WO2004035317(A1) |
申请公布日期 |
2004.04.29 |
申请号 |
WO2003JP13088 |
申请日期 |
2003.10.10 |
申请人 |
CITIZEN WATCH CO., LTD.;SHIOTA, AKIRA;YASUNAGA, MAKOTO;MASUBUCHI, SADAO;IWAKO, AKINOBU |
发明人 |
SHIOTA, AKIRA;YASUNAGA, MAKOTO;MASUBUCHI, SADAO;IWAKO, AKINOBU |
分类号 |
B41J2/45;G06K15/12;(IPC1-7):B41J2/445 |
主分类号 |
B41J2/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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