发明名称 EXPOSURE SYSTEM AND PRODUCTION METHOD FOR EXPOSURE SYSTEM
摘要 <p>An exposure system storing a current value properly determined for supply to a light emitting element, and a production method for producing such an exposure system. The production method is characterized by comprising the steps of supplying a reference current to a light emitting element to respectively measure light quantities from a plurality of pixels of an optical modulation element, judging whether a minimum value of light quantities from the plurality of pixels falls within a predetermined range, and, if the minimum value does not fall within the range, determining a current value to be supplied to a light emitting element that allows the minimum value to fall within the range.</p>
申请公布号 WO2004035317(A1) 申请公布日期 2004.04.29
申请号 WO2003JP13088 申请日期 2003.10.10
申请人 CITIZEN WATCH CO., LTD.;SHIOTA, AKIRA;YASUNAGA, MAKOTO;MASUBUCHI, SADAO;IWAKO, AKINOBU 发明人 SHIOTA, AKIRA;YASUNAGA, MAKOTO;MASUBUCHI, SADAO;IWAKO, AKINOBU
分类号 B41J2/45;G06K15/12;(IPC1-7):B41J2/445 主分类号 B41J2/45
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