| 摘要 |
The invention relates to a method for producing UV absorption layers on organic or inorganic substrates. The inventive method consists in a) acting by a low-temperature plasma, or a corona discharge, or energy-rich radiation on an organic or inorganic substrate, b) in applying at least one radical formi ng initiator and at least one UV absorber containing at least one unsaturated ethylene group, and a synergist agent and/or an unsaturated ethylene compoun d eventually in the form of a molten material, solutions, suspensions or emulsions to said organic or inorganic substrates; and c) heating the coated substrate and/or irradiating it with electromagnetic waves. The inventive substrate provided with an UV absorption layer is also disclosed. Said metho d generally excludes vacuum conditions, a high energetic or thermal load, and the fracture of the UV absorber. Said invention makes it possible to produce transparent UV absorption layers which exhibit high adherence ability and whose properties are usefully modulated, for example like optical density.</ SDOAB>
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