Storage phosphor screen and preparation method

摘要

A method of preparing a phosphor screen having at least a substrate and a phosphor layer comprising a CsX:Eu<2+> phosphor wherein X represents a halide selected from a group consisting of Br and Cl and wherein the phosphor is deposited by physical vapour deposition on the substrate. During deposition the substrate is at a temperature in the range of 135° C. to 235° C. and variation of the temperature of the substrate occurring during the deposition process is not more than 50° C.