发明名称 Method of using an amorphous carbon layer for improved reticle fabrication
摘要 A method of using an amorphous carbon layer for improved reticle fabrication includes depositing a stack of layers including a substrate, an absorber, a transfer layer, an anti-reflective coating (ARC) layer, and a photoresist layer, patterning the photoresist layer, and etching the ARC layer and the transfer layer. The method also includes etching the absorber layer and removing the transfer layer. The transfer layer including amorphous carbon.
申请公布号 US2004079726(A1) 申请公布日期 2004.04.29
申请号 US20020190138 申请日期 2002.07.03
申请人 ADVANCED MICRO DEVICES, INC. 发明人 TABERY CYRUS E.;LYONS CHRISTOPHER F.
分类号 G03F1/08;H01L21/027;(IPC1-7):C23F1/00;B44C1/22;C03C15/00;C03C25/68 主分类号 G03F1/08
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