发明名称 Method of fabricating a thin film transistor using dual or multiple gates
摘要 The probability of maximum number of crystal boundaries in active channel regions, is calculated. A gap between the channels capable of synchronizing boundaries in each channel region of transistor is adjusted by dual/multiple gates based on the probability value that defines size of silicon grain, inclination angle of boundaries with respect to channel direction of gates and the width and length of the channels.
申请公布号 EP1414062(A2) 申请公布日期 2004.04.28
申请号 EP20030090360 申请日期 2003.10.21
申请人 SAMSUNG SDI CO., LTD. 发明人 LEE, KI-YONG
分类号 H01L29/786;H01L21/336;H01L21/77;H01L21/8234;H01L29/04 主分类号 H01L29/786
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