发明名称 INDUCTIVELY COUPLED PLASMA GENERATOR HAVING SERPENTINE COIL ANTENNA
摘要 PURPOSE: An inductively coupled plasma generator having a serpentine coil antenna is provided to enhance the uniformity of plasma, reduce the inductance of an antenna, and restrict a capacitive coupling effect by improving a structure of the inductively coupled plasma generator. CONSTITUTION: An inductively coupled plasma generator having a serpentine coil antenna includes a reaction chamber(110), an antenna(120), and an RF power supply(132). The inside of the reaction chamber(110) is in a state of vacuum. The antenna(120) is installed at an upper part of the reaction chamber. The antenna is used for ionizing reaction gases injected into the inside of the reaction chamber and generating plasma. The RF power supply(132) is connected to the antenna in order to supply the RF power to the antenna. The antenna is formed with a plurality of coils having different radiuses. One of the coils is formed with a serpentine coil, which is wound in zigzags along the circumferential direction.
申请公布号 KR20040033562(A) 申请公布日期 2004.04.28
申请号 KR20020062701 申请日期 2002.10.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SEONG GU;LEE, YEONG DONG;SHIN, JAE GWANG;TOLMACHEV,YURI
分类号 H05H1/46;C23C16/505;C23F4/00;H01J37/32;H01L21/3065;H05H1/48;(IPC1-7):H05H1/48 主分类号 H05H1/46
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