THINNER COMPOSITION AND STRIPPING METHOD OF PHOTORESIST USING THE SAME

摘要

PURPOSE: A thinner composition and a stripping method of photoresist using the same are provided to be capable of obtaining excellent stripping characteristics and reducing the cost of thinner composition. CONSTITUTION: A thinner composition for stripping photoresist is mainly made of propylene glocol monomethyl ether acetate, ethyl 3-ethoxy propionate, and gamma-butyrolactone. Preferably, the contents of the propylene glocol monomethyl ether acetate, the ethyl 3-ethoxy propionate, and the gamma-butyrolactone are 50-80 weight%, 10-45 weight%, and 1-12 weight%, respectively. Preferably, the contents are 53-75 weight%, 12-30 weight%, and 2-10 weight%, respectively. Preferably, the thinner composition further contains surfactant.