SPUTTERING MAGNETRON ARRANGEMENTS WITH ADJUSTABLE MAGNETIC FIELD STRENGTH
摘要
A sputtering magnetron arrangement is disclosed, comprising a magnetic field generator (1) and a target (4) which is associated with said magnetic field generator (1). The magnetic field generator (1) includes a magnetically active element (5-9) and an adjusting means (20-25) which is adapted to deform or deflect locally the magnetically active element (5-9) so as to alter with respect to the target (4) the position of at least a portion of the magnetic field generator (1).
申请公布号
EP1412964(A1)
申请公布日期
2004.04.28
申请号
EP20020727537
申请日期
2002.04.05
申请人
N.V. BEKAERT S.A.
发明人
DE BOSSCHER, WILMERT, CYRIEL, STEFAAN;LAMMENS, JEAN-PAUL;BROCHE, RONNY;GOBIN, GUY;BLONDEEL, ANJA, G., J.