WAFER WET ETCHING APPARATUS HAVING OVER-ETCHING PREVENTION FUNCTION

摘要

PURPOSE: A wafer wet etching apparatus having an over-etching prevention function is provided to be capable of improving the yield of wafers. CONSTITUTION: A wafer wet etching apparatus includes an equipment control part(404), a chemical bath(301), and a drain pump(308). The chemical bath includes an outer bath(302) having a chemical drain valve(305) for exhausting chemical and an inner bath. At this time, the inner bath includes a chemical source valve(306) for supplying the chemical and a quick drain valve(307) connected with the drain pump for quickly exhausting the chemical. When related equipment malfunctions, an electric signal is transmitted from the equipment control part to the drain pump for operating the drain pump, so that the chemical of the chemical bath is exhausted.