发明名称 System for imaging a cross-section of a substrate
摘要 A system for obtaining an image of a cross-sectional surface of a workpiece includes a shaped beam ion projection column oriented along a first axis. The ion projection column projects an image of an aperture on the workpiece surface, thereby excavating a portion of the surface and exposing a cross-sectional surface. Because the ion beam is not focused on the surface, a low brightness ion source can be used. A focused particle beam column, typically a scanning electron microscope, is oriented along a second axis that intersects the first axis at a selected angle. This focused particle beam column generates a particle beam that is used to image the cross-sectional surface exposed by the ion projection column.
申请公布号 US6727500(B1) 申请公布日期 2004.04.27
申请号 US20000513826 申请日期 2000.02.25
申请人 FEI COMPANY 发明人 BERGER STEVE;SCIPIONI LAWRENCE
分类号 G01N23/225;G01Q30/02;H01J37/30;H01J37/305;H01L21/66;(IPC1-7):G01N23/00 主分类号 G01N23/225
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