发明名称 Device and method of correcting exposure defects in photolithography
摘要 A corrective filter for use in an optical system to correct a defect in a reticule and/or pellicle. The corrective filter may be positioned between a light source and the reticule, between the reticule and a wafer, or in combination with the reticule and/or pellicle. The invention provides a method of characterizing the optical properties of the corrective filter.
申请公布号 US6727975(B1) 申请公布日期 2004.04.27
申请号 US19990332856 申请日期 1999.06.14
申请人 MICRON TECHNOLOGY, INC. 发明人 HICKMAN CRAIG A.
分类号 G03B27/68;G03F7/20;(IPC1-7):G03B27/68;G03B27/54;G03B27/72 主分类号 G03B27/68
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