| 摘要 |
Disclosed are an element comprising a hard metal substrate ( 10 ) and a diamond layer ( 30 ), and a method for coating a hard metal substrate ( 10 ). Said hard metal substrate is provided with hard material particles ( 20 ) and surrounding binder material ( 22 ). The hard material particles ( 20 ) are surrounded by binding material ( 22 ) in a first area ( 24 ) comprising intact hard metal. The transition region of the first area ( 24 ) encompasses a deep profile having recesses ( 18 ) and elevations ( 16 ). The diamond layer ( 30 ) is braced with the substrate material ( 10 ) with the aid of said deep profile, portions of the diamond layer ( 30 ) being disposed deeper within the substrate ( 10 ) than elevations ( 16 ) of the first area ( 24 ). Said structure is obtained by means of a pretreatment process in which a hard metal substrate ( 10 ) is first subjected to selective etching in order to remove the binding material ( 22 ). A porous zone having a deep profile is formed. The hard material particles located within the porous zone ( 12 ) are removed by means of microbeams or a second, WC-selective etching step. A cobalt concentration on the surface is finally removed in a Co-selective etching step, and the substrate ( 10 ) is coated with a diamond layer by means of CVD. |
