METHOD OF EVALUATING PROCESS MARGIN, METHOD OF SETTING MEASURING CONDITIONS, PROCESS MARGIN EVALUATION PROGRAM, AND MEASURING CONDITIONS SETTING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a method of evaluating a process margin for correctly evaluating it. SOLUTION: For an exposure process for forming a pattern on a substrate onto which a pattern is to be transferred, a plurality of exposure energies and a plurality of focus positions are set. For each combination of the set values of exposure energy and focus position, a plurality of pseudo-measurement dimensions of the pattern is calculated. Based on the pseudo-measurement dimensions of the pattern for each combination, a plurality of ED-trees are calculated to calculate a plurality of margin curves. A variance of margins of exposure energy among the plurality of margin curves at a focus depth corresponding to the maximum difference in level of the substrate onto which the pattern is to be transferred is calculated. COPYRIGHT: (C)2004,JPO