| 发明名称 |
ANTIREFLECTION FILM FORMING COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film forming composition which exhibits excellent light absorptivity to the light of wavelength used in manufacture of a semiconductor device, has a high antireflection light effect and has larger dry etching speed compared to a photoresist layer. <P>SOLUTION: The antireflection film forming composition contains a glycoluril compound substituted with hydroxyl alkyl group and alkoxyalkyl group, a light absorptive compound and/or light absorptive resin. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2004126161(A) |
申请公布日期 |
2004.04.22 |
| 申请号 |
JP20020289102 |
申请日期 |
2002.10.01 |
| 申请人 |
NISSAN CHEM IND LTD |
发明人 |
ARASE SHINYA;KISHIOKA TAKAHIRO;MIZUSAWA KENICHI;NAKAYAMA KEISUKE;ENOMOTO TOMOYUKI |
| 分类号 |
G03F7/11;C08G85/00;C09D5/00;C09D7/12;C09D187/00;C09D201/00;C09D201/02;G03F7/004;H01L21/027 |
主分类号 |
G03F7/11 |
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