| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for making work in an electrical discharge chamber easy and for making it possible to process uniformly matter to be processed. SOLUTION: In the plasma processing apparatus, a hermetically sealed plasma processing space is formed by using a base platform 21 and a cover member 22. The cover member 22 can contact and separate from the base platform 21. A gas supply port 24 is provided in a side of the cover member 22 and a gas exhaust port 25 in a side of the base platform 21. Thereby, gases flow uniformly on a surface of the matter to be processed, allowing more uniform plasma surface processing. COPYRIGHT: (C)2004,JPO
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