发明名称 |
DEFLECTOR, METHOD OF MANUFACTURING DEFLECTOR, AND CHARGED PARTICLE BEAM EXPOSURE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a deflector that can accurately deflect a charged particle beam and has a long service life. SOLUTION: This deflector which deflects the charged particle beam is provided with a substrate having an opening formed for passing the charged particle beam and a first and a second conductive members provided in the opening to deflect the charged particle beam and formed by plating. The second conductive member is provided on the surface of the first conductive member and is more hardly oxidized than the first conductive member. In addition, the first conductive member is formed of a material which is smaller in residual stress than the second conductive member. COPYRIGHT: (C)2004,JPO
|
申请公布号 |
JP2004128285(A) |
申请公布日期 |
2004.04.22 |
申请号 |
JP20020291710 |
申请日期 |
2002.10.03 |
申请人 |
ADVANTEST CORP;CANON INC;HITACHI LTD |
发明人 |
ASANO KOJI;HASHIMOTO SHINICHI;TAMAMORI KENJI;IWASAKI YUICHI;MURAKI MASATO;NAKAYAMA YOSHINORI;ESASHI MASAKI |
分类号 |
G03F7/20;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|