METHOD FOR FORMING SEMICONDUCTOR FILM AND USE OF SEMICONDUCTOR FILM

摘要

A method for forming a semiconductor film, characterized in that it comprises spraying a dispersion containing fine semiconductor particles onto a surface of a substrate in such a manner that sprayed particles from the dispersion discharged from a spray coater have an average particle diameter of ca. 30 mum or less, followed by drying, thereby forming a porous semiconductor film; and a use of a semiconductor film formed by said method for forming a semiconductor film.