| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polysiloxane which exhibits a high transparency at a wavelength of 193 nm or less and is excellent in dry etching resistance, especially in environmental resistance; a new silicon-containing compound useful e.g. as a raw material for synthesizing the polysiloxane; and a radiation-sensitive resin composition containing the polysiloxane. <P>SOLUTION: The silicon-containing compound is represented by formula (1) (wherein X<SP>1</SP>is an optionally substituted 2-20C divalent hydrocarbon group; R<SP>1</SP>and R<SP>2</SP>are each H, a halogen, an alkoxy group or an optionally halogenated hydrocarbon group, provided each of two or three R<SP>1</SP>'s are a halogen or an alkoxy group; and m and n are each 0, 1, 2 or 3, provided (m+n)<6). The polysiloxane is obtained by polycondensing the silicon-containing compound. The radiation-sensitive resin composition contains the polysiloxane and a radiation-sensitive acid generator. <P>COPYRIGHT: (C)2004,JPO |
