| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a composition for dissolving and removing impurities comprising metallic tantalum and tantalum compounds produced in a manufacturing process of a semiconductor without damaging the other materials forming the semiconductor and a dissolving method employing the composition. <P>SOLUTION: The composition is a composition for dissolving tantalum including water and polyhydric alcohol such as glycol groups, succharide, and polyol groups. On the basis of the total weight of the composition, 0.01 to 50 wt.% of the polyhydric alcohol such as ethylene glycol, glucose, sorbitol, and glycerol is preferably contained and the composition may contain water soluble polymer. <P>COPYRIGHT: (C)2004,JPO</p> |
