发明名称 MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electrooptical device having many light-emitting layers easily and surely preventing permeation of oxygen and hydrogen into the light-emitting layers and an eledtrode, having a light-emitting element with a long life, and to provide an electronic apparatus equipped with the electrooptical device. SOLUTION: The manufacturing method of the electrooptical device, composed of a first electrode 23, an element layer having at least one layer of functioning layer (a light-emitting layer) 60, and a second electrode 50 formed on a substrate 200 in this sequence, comprises a process of gas barrier layer forming process forming a gas barrier layer 30 in a state covering a part of the second electrode 50 exposed on the second substrate 200. The gas barrier layer forming process is composed of a process of forming a first gas barrier layer 30a on the second electrode 50 by a physical vapor deposition method, and a process of forming a gas barrier layer 30b on the first gas barrier layer 30a by the chemical vapor deposition method. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004127608(A) 申请公布日期 2004.04.22
申请号 JP20020287455 申请日期 2002.09.30
申请人 SEIKO EPSON CORP 发明人 HAYASHI KENJI
分类号 H05B33/10;H01L27/32;H01L51/50;H01L51/52;H05B33/04;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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