PLASMA PROCESSING APPARATUS AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and method in which double erosion is formed and non-erosion regions is hardly produced. SOLUTION: The plasma processing apparatus is provided with a vacuum vessel which can maintain a vacuum, a gas supply and exhaust device which exhausts gas while supplying the gas into the vacuum vessel, a cathode electrode which exists in the vacuum vessel and is provided with a target, a substrate electrode which is disposed opposite to the target and can be placed with the substrate, and a power supply device which applies high-frequency electric power to the cathode electrode. The apparatus is provided with a plurality of annular magnets on the periphery of the substrate electrode and is provided with a cathode magnet of an annular or cylindrical shape in the position facing the cathode electrode across the target. Thereby double erosion is formed and the non-erosion regions is hardly produced on the target. COPYRIGHT: (C)2004,JPO