发明名称 METHOD OF MANUFACTURING REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE, AND REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflection type liquid crystal display device having a reflection electrode without any ruggedness on its surface, and to provide the reflection type liquid crystal display device manufactured by the method. <P>SOLUTION: A gate bus line, a data bus line, a TFT and the like are formed on a glass substrate 121, then a final protective film 131 is formed and then a positive photoresist film 133 is formed on the final protective film 131 and subjected to exposure and development treatment to form aperture parts corresponding to contact holes 131a and 131b of the final protective film 131. The resist film is post-baked at 130 to 165&deg;C and then B (boron) or P (phosphorus) is ion-injected to the resist film 133 to harden the surface layer thereof. The resist film 133 is subjected to heat treatment at 200 to 230&deg;C to form a wrinkle-like ruggedness on the surface of the resist film 133, then a metal film is deposited on the resist film 133 and the metal film is patterned to form the reflection electrode. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004126021(A) 申请公布日期 2004.04.22
申请号 JP20020287441 申请日期 2002.09.30
申请人 FUJITSU DISPLAY TECHNOLOGIES CORP 发明人 DOI SEIJI;KUROSAWA NORIO
分类号 G02F1/1335;G02F1/1343;G02F1/1368;G03F7/40;H01L21/336;H01L29/786 主分类号 G02F1/1335
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